TEL. 03−3262-4296
2-5-10 Kudan-Minami Chiyoda-Ku Tokyo 102-0074 Japan
SiGe: 4 & 8 inch Ge concentration: approx. 10-40% * We can also use
SOI wafers as substrates.
Ge: 2-6 inch Orientation: <100>, <111>
GeEpi: 4,6 & 8inch * We can also use SOI wafers as substrates.
GaAs: 2-6 inch
GaP: 2 inch
InP: 3 & 4 inch (ex. 3inch, CC range: 0.8-4E18p3, EPD: below 500pcs/cm2)
InSb: 2 inch
ZnO: 20 mm x 20 mm, 10 mm x 10 mm, 5 mm x 5 mm etc.
MgO: 2 inch
InAs: 2 inch
GaSb: 2-4 inch
Nitride EPI: 4-8 inch
CdZnTe: 2-4 inch
GaInP: 2-6 inch
Other materials: GaAlAs,LaAlO3, Al2O3, LAO,LiNbO3,CdTe,LiTaO3,LN,ZnSe etc.
2-5-10 Kudan-Minami Chiyoda-Ku Tokyo 102-0074 Japan
TEL 81-3-3262-4296
FAX 81-3-3262-4048
3-11-26 Nishinakajima Yodogawa-ku Osaka-shi Osaka 532-0011 JAPAN
TEL 81-6-6307-5495
FAX 81-6-6307-5496